Mask manufacturing contribution on 248-nm and 193-nm lithography performances.
| Autor: | Barberet, Alexandra, Fanget, Gilles L., Richoilley, Jean-Charles, Tissier, Michel, Quere, Yves |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p90-98, 9p |
| Databáze: | Complementary Index |
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