Front-end-of-line process development using 193-nm lithography.
| Autor: | Pollentier, Ivan K., Ercken, Monique, Eliat, Astrid, Delvaux, Christie, Jaenen, Patrick, Ronse, Kurt G. |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p56-67, 12p |
| Databáze: | Complementary Index |
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