Increasing etch uniformity using in-line endpoint systems on complex spacer technology.
| Autor: | Kempa, Danielle K., Hyland, Sandra L. |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p200-204, 5p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Kempa, Danielle K., Hyland, Sandra L. |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p200-204, 5p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|