Advanced e-beam reticle writing system for next-generation reticle fabrication.
| Autor: | Fujii, Akira, Mizuno, Kazui, Nakahara, Tetsuji, Asai, Suyo, Kadowaki, Yasuhiro, Shimada, Hajime, Touda, Hiroshi, Iizumi, Ken, Takahashi, Hiroyuki, Oonuki, Kazuyoshi, Kawahara, Toshikazu, Kawasaki, Katsuhiro, Nagata, Koji, Satoh, H. |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p258-269, 12p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|