Fabrication of NIST-format x-ray masks with 4-Gb DRAM patterns.
| Autor: | Tanaka, Yuusuke, Fujii, Kiyoshi, Suzuki, Kenichiro, Iwamoto, Toshiyuki, Tsuboi, Shinji, Matsui, Yasuji |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p660-668, 9p |
| Databáze: | Complementary Index |
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