Stencil masks for electron-beam projection lithography.
| Autor: | Kurihara, Kenji, Iriguchi, H., Motoyoshi, A., Tabata, T., Takahashi, S., Iwamoto, K., Okada, Ikuo, Yoshihara, Hideo, Noguchi, Hitoshi |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p726-733, 8p |
| Databáze: | Complementary Index |
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