RF magnetron sputtering SiOx, ZnS, and Al2O3 films for capsulation of nanostructured porous silicon.

Autor: Monastyrskii, Liubomyr S., Kovtun, Roman M., Vlasov, Andrii P., Kostukevich, Sergii O.
Zdroj: Proceedings of SPIE; Nov2001, Issue 1, p233-237, 5p
Databáze: Complementary Index