0.35-um rule, high-density, full-chip x-ray mask patterning.
| Autor: | Chijimatsu, Tatsuo, Kawakami, Ken'ichi, Nakaishi, Masafumi, Kondo, Kazuaki, Nakabayashi, Masaaki, Yamabe, Masaki, Sugishima, Kenji |
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| Zdroj: | Proceedings of SPIE; Nov1993, Issue 1, p395-406, 12p |
| Databáze: | Complementary Index |
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