193 nm lithography with ultrathin surface imaging resist systems.
| Autor: | Dulcey, Charles S., Koloski, Tim S., Dressick, Walter J., Chen, Mu-San, Georger Jr., Jacque H., Calvert, Jeffrey M. |
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| Zdroj: | Proceedings of SPIE; Nov1993, Issue 1, p657-665, 9p |
| Databáze: | Complementary Index |
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