Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k1 of 0.25.
| Autor: | French, Roger H., Sewell, Harry, Yang, Min K., Peng, Sheng, McCafferty, Diane, Qiu, Weiming, Wheland, Robert C., Lemon, Michael F., Markoya, Louis, Crawford, Michael K. |
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| Zdroj: | Journal of Micro/Nanolithography, MEMS & MOEMS; Jul2005, Vol. 4 Issue 3, p031103-031103-14, 14p |
| Databáze: | Complementary Index |
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