Complementary double-exposure technique (CODE): a way to print 80- and 65-nm gate levels using a double-exposure binary mask approach.
| Autor: | Manakli, Serdar, Trouiller, Yorick, Toublan, Olivier, Schiavone, Patrick, Rody, Yves, Goirand, P. J. |
|---|---|
| Zdroj: | Journal of Micro/Nanolithography, MEMS & MOEMS; Apr2004, Vol. 3 Issue 2, p305-315, 11p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|