High-resolution maskless lithography.

Autor: Chan, Kin Foong, Feng, Zhiqiang, Yang, Ren, Ishikawa, Akihito, Mei, Wenhui
Zdroj: Journal of Micro/Nanolithography, MEMS & MOEMS; Oct2003, Vol. 2 Issue 4, p331-339, 9p
Databáze: Complementary Index