High-resolution maskless lithography.
Autor: | Chan, Kin Foong, Feng, Zhiqiang, Yang, Ren, Ishikawa, Akihito, Mei, Wenhui |
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Zdroj: | Journal of Micro/Nanolithography, MEMS & MOEMS; Oct2003, Vol. 2 Issue 4, p331-339, 9p |
Databáze: | Complementary Index |
Externí odkaz: |