Study of Atmospheric MOCVD of TiO2 Thin Films by Means of Computational Fluid Dynamics Simulations.

Autor: Baguer, Neyda, Neyts, Erik, Van Gils, Sake, Bogaerts, Annemie
Zdroj: Chemical Vapor Deposition; Nov2008, Vol. 14 Issue 11/12, p339-346, 8p
Databáze: Complementary Index