Deposition of HfO2, Gd2O3 and PrO x by Liquid Injection ALD Techniques.
| Autor: | Potter, R. J., Chalker, P. R., Manning, T. D., Aspinall, H. C., Loo, Y. F., Jones, A. C., Smith, L. M., Critchlow, G. W., Schumacher, M. |
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| Zdroj: | Chemical Vapor Deposition; Mar2005, Vol. 11 Issue 3, p159-169, 11p |
| Databáze: | Complementary Index |
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