Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films.
| Autor: | Williams, P. A., Roberts, J. L., Jones, A. C., Chalker, P. R., Tobin, N. L., Bickley, J. F., Davies, H. O., Smith, L. M., Leedham, T. J. |
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| Zdroj: | Chemical Vapor Deposition; Jul2002, Vol. 8 Issue 4, p163-170, 8p |
| Databáze: | Complementary Index |
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