Evaluation of Chemometric Models in an FTIR Study of the Gas Phase During Atmospheric-Pressure CVD of Tin Oxide Thin Films.

Autor: Alcott, G. R., van Mol, A. M. B., Spee, C. I. M. A.
Zdroj: Chemical Vapor Deposition; Oct2000, Vol. 6 Issue 5, p261-268, 8p
Databáze: Complementary Index
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