Metal Organic CVD of Cobalt Thin Films Using Cobalt Tricarbonyl Nitrosyl.

Autor: Lane, Penelope A., E.Oliver, Peter, Wright, Peter J., Reeves, Christopher L., Pitt, Anthony D., Cockayne, Brian
Zdroj: Chemical Vapor Deposition; Oct1998, Vol. 4 Issue 5, p183-186, 4p
Databáze: Complementary Index