Atmospheric pressure chemical vapor deposition of SiO2-TiO2 antireflective films from [tri-( tert-butoxy)siloxy-tri-( tert-butoxy)]titanium, [ tC4H9O]3Si-O-Ti[O tC4H9]3, which is a single source alkoxide precursor

Autor: Narula, Chaitanya K., Varshney, Ashima, Riaz, Umar
Zdroj: Chemical Vapor Deposition; Jan1996, Vol. 2 Issue 1, p13-15, 3p
Databáze: Complementary Index
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