Multiwafer atmospheric-pressure MOVPE reactor for nitride semiconductors and ex-situ dry cleaning of reactor components using chlorine gas for stable operation.

Autor: Tokunaga, Hiroki, Fukuda, Yasushi, Ubukata, Akinori, Ikenaga, Kazutada, Inaishi, Yoshiaki, Orita, Takashi, Hasaka, Satoshi, Kitamura, Yuichiro, Yamaguchi, Akira, Koseki, Shuichi, Uematsu, Kunimasa, Tomita, Nobuyasu, Akutsu, Nakao, Matsumoto, Koh
Zdroj: Physica Status Solidi (C); Jul2008, Vol. 5 Issue 9, p3017-3019, 3p
Databáze: Complementary Index
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