Atmospheric-Pressure Plasmas for Wide-Area Thin-Film Deposition and Etching.
| Autor: | Hopfe, Volkmar, Sheel, David W. |
|---|---|
| Zdroj: | Plasma Processes & Polymers; Apr2007, Vol. 4 Issue 3, p253-265, 13p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|
| Autor: | Hopfe, Volkmar, Sheel, David W. |
|---|---|
| Zdroj: | Plasma Processes & Polymers; Apr2007, Vol. 4 Issue 3, p253-265, 13p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|
Plný text