Direct patterning of polysilanes and polygermanes using interference lithography.

Autor: Yang, Yun, Lu, Cheng, Dias, Eva A., Lipson, Robert H., Baines, Kim M.
Zdroj: Applied Organometallic Chemistry; Sep2011, Vol. 25 Issue 9, p665-668, 4p
Databáze: Complementary Index
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