ChemInform Abstract: Open Questions Regarding the Mechanism of Plasma-Induced Deposition of Silicon.
Autor: | VEPREK, S., VEPREK-HEIJMAN, M. G. J. |
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Zdroj: | ChemInform; Nov1991, Vol. 22 Issue 46, pno-no, 1p |
Databáze: | Complementary Index |
Externí odkaz: |