ChemInform Abstract: The Hydrogen Content and Properties of SiO2 Films Deposited from Tetraethoxysilane at 27 MHz in Various Gas Mixtures.
| Autor: | VEPREK-HEIJMAN, M. G. J., BOUTARD, D. |
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| Zdroj: | ChemInform; Oct1991, Vol. 22 Issue 40, pno-no, 1p |
| Databáze: | Complementary Index |
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