Erratum: “Ion-channeling analysis of boron clusters in silicon” [J. Appl. Phys. 90, 4741 (2001)].
| Autor: | Selen, L. J. M., Janssen, F. J. J., van IJzendoorn, L. J., de Voigt, M. J. A., Theunissen, M. J. J., Smulders, P. J. M., Eijkemans, T. J. |
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| Zdroj: | Journal of Applied Physics; 4/15/2002, Vol. 91 Issue 8, p5507, 1p |
| Abstrakt: | © 2002 American Institute of Physics. [ABSTRACT FROM AUTHOR] |
| Databáze: | Complementary Index |
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