Patterning Mesoscale Gradient Structures with Self-Assembled Monolayers and Scanning Tunneling Microscopy Based Replacement Lithography.

Autor: Fuierer, R.R., Carroll, R.L., Feldheim, D.L., Gorman, C.B.
Zdroj: Advanced Materials; Jan2002, Vol. 14 Issue 2, p154-157, 4p
Databáze: Complementary Index
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