An aqueous-base developable photoresist based on light-induced cationic polymerization: Resist performance of poly(glycidyl methacrylate- co-methacrylic acid).

Autor: Naitoh, Kazuhiko, Koseki, Ken'ichi, Yamaoka, Tsuguo
Zdroj: Journal of Applied Polymer Science; Oct1993, Vol. 50 Issue 2, p243-250, 8p
Databáze: Complementary Index
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