Plasma developable photoresist containing electronic excitation energy quenching system.

Autor: Tsuda, Minoru, Oikawa, Setsuko, Yokota, Akira, Yabuta, Mitsuo, Kanai, Wataru, Kashiwagi, Ken-Ichi, Hijikata, Isamu, Nakane, Hisashi
Zdroj: Polymer Engineering & Science; Dec1983, Vol. 23 Issue 18, p993-999, 7p
Databáze: Complementary Index
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