Azide-phenolic resin UV resist (MRL) for microlithography.

Autor: Iwayanagi, Takao, Hashimoto, Michiaki, Nonogaki, Saburo, Koibuchi, Shigeru, Makino, Daisuke
Zdroj: Polymer Engineering & Science; Dec1983, Vol. 23 Issue 17, p935-940, 6p
Databáze: Complementary Index
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