Influence of the Plasma Kinetics on the Si/C Ratio of a-Si xC1- x: H Thin Films Deposited by Reactive Magnetron Sputtering of a Si Target in Ar + CH4 Gas Mixtures.
| Autor: | Statev, Sv., Ivanov, I., Petrov, I., Carlsson, J., Orlinov, V. |
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| Zdroj: | Contributions to Plasma Physics; 1994, Vol. 34 Issue 1, p39-49, 11p |
| Databáze: | Complementary Index |
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