On the Causes and Effects of Contaminations during rf Diode Deposition of Cr-Si Alloys.
Autor: | Sobe, G., Schreiber, H., Weise, G., Heinrich, A. |
---|---|
Zdroj: | Contributions to Plasma Physics; 1993, Vol. 33 Issue 4, p325-335, 11p |
Databáze: | Complementary Index |
Externí odkaz: |