In situ preparation of lithographic resists containing glutarimide groups.

Autor: Hiraoka, Hiroyuki, Gipstein, Edward, Bargon, Joachim, Welsh, L. W.
Zdroj: Journal of Applied Polymer Science; Dec1978, Vol. 22 Issue 12, p3397-3403, 7p
Databáze: Complementary Index
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