| Autor: |
Hada, Masaki, Hontani, Yusaku, Ibuki, Sachi, Ichiki, Kazuya, Ninomiya, Satoshi, Seki, Toshio, Aoki, Takaaki, Matsuo, Jiro |
| Předmět: |
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| Zdroj: |
AIP Conference Proceedings; 1/7/2011, Vol. 1321 Issue 1, p314-316, 3p |
| Abstrakt: |
The surface of L-leucine films irradiated with an Ar5000 cluster ion beam (5 keV) was characterized by using the X-ray reflective (XRR) measurement method, atomic force microscopy (AFM) and ellipsometry. No significant damage was detected on the surface of the L-leucine films irradiated with the Ar cluster ion beam. Therefore, the large cluster-low-energy (about 1 eV/atom) beam would be suitable for low-damage etching of organic materials. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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