| Autor: |
Ohchi, Tadayuki, Yamaguchi, Naohiro, Fujikawa, Chiemi, Hara, Tamio, Watanabe, Katsumi, Tanaka, Ibuki, Taguchi, Masami |
| Předmět: |
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| Zdroj: |
AIP Conference Proceedings; 2000, Vol. 507 Issue 1, p468, 4p |
| Abstrakt: |
We have constructed an x-ray photoelectron microscopic system with an x-ray laser as an x-ray source. The lasing line is the Li-like Al 3d-4f transition at 15.47 nm where the recombining Al plasma is used as the x-ray laser medium. The beam from the x-ray laser cavity was then focused by using a Schwarzschild mirror coated with Mo/Si multilayers. The x-ray beam size with a diameter less than 0.5 μm and the estimated photon number of about 2 × 10[sup 6] photons/shot into the spot were achieved. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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