| Autor: |
Hoflund, Gar B., Gonzalez, Rene I., Phillips, Shawn H. |
| Předmět: |
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| Zdroj: |
Journal of Adhesion Science & Technology; Oct2001, Vol. 15 Issue 10, p1199-1211, 13p |
| Abstrakt: |
The surface of a polyhedral oligomeric silsesquioxane-polyurethane copolymer has been characterized in situ using X-ray photoelectron spectroscopy before and after exposure to incremental fluences of oxygen atoms produced by a hyperthermal oxygen atom source. The data indicate that the atomic oxygen initially attacks the cyclopentyl groups that surround the polyhedral oligomeric silsesquioxane cage most likely resulting in the formation and desorption of CO and/or CO[sub 2] and H[sub 2]O from the surface. The carbon concentration in the near-surface region is reduced from 72.5 at.% for the as-entered surface to 37.8 at.% following 63 h of O-atom exposure at a flux of 2.0 × 10[sup 13] O atom/cm[sup 2]-s. The oxygen and silicon concentrations are increased with incremental exposures to the O-atom flux. The oxygen concentration increases from 18.5 at.% for the as-entered sample to 32.6 at.% following the 63-h exposure, and the silicon concentration increases from 8.1 to 11.1 at.% after 63 h. The data reveal the formation of a silica layer on the surface, which serves as a protective barrier preventing further degradation of the polymer underneath with increased exposure to the O-atom flux. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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