Coupled surface plasmon interference lithography based on a metal-bounded dielectric structure.

Autor:	Xiaowei Guo, Qiming Dong
Předmět:	SURFACE plasmon resonance PHOTOLITHOGRAPHY DIELECTRICS NANOSTRUCTURES NUMERICAL analysis
Zdroj:	Journal of Applied Physics; Dec2010, Vol. 108 Issue 11, p113108, 4p, 1 Diagram, 6 Graphs
Abstrakt:	We propose a coupled surface plasmon (SP) interference lithography based on a metal-bounded dielectric structure. The long and short range SP interferences at different dielectric thicknesses in the structure are analyzed. The interference in Kretschmann structure under the same conditions is also compared. Numerical results show the coupled SP interference offers better lithography performance as compared with the Kretschmann SP interference. This proposed technique provides potential for fabrication of periodic nanostructures. [ABSTRACT FROM AUTHOR]
Databáze:	Complementary Index
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