Autor: |
Swan, A.K., Moiseev, L.A., Cantor, C.R., Davis, B., Ippolito, S.B., Karl, W.C., Goldberg, B.B., Unlu, M.S. |
Zdroj: |
IEEE Journal of Selected Topics in Quantum Electronics; Mar/Apr2003, Vol. 9 Issue 2, p294-300, 7p |
Abstrakt: |
We introduce a new fluorescence microscopy technique that maps the axial position of a fluorophore with subnanometer precision. The interference of the emission of fluorophores in proximity to a reflecting surface results in fringes in the fluorescence spectrum that provide a unique signature of the axial position of the fluorophore. The nanometer sensitivity is demonstrated by measuring the height of a fluorescein monolayer covering a 12-nm step etched in silicon dioxide. In addition, the separation between fluorophores attached to the top or the bottom layer in a lipid bilayer film is determined. We further discuss extension of this microscopy technique to provide resolution of multiple layers spaced as closely as 10 nm for sparse systems. [ABSTRACT FROM PUBLISHER] |
Databáze: |
Complementary Index |
Externí odkaz: |
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