| Autor: |
Woo Jin Bae, Markos Trikeriotis, Jing Sha, Evan L. Schwartz, Robert Rodriguez, Paul Zimmerman, Emmanuel P. Giannelis, Christopher K. Ober |
| Zdroj: |
Journal of Materials Chemistry; 7/7/2010, Vol. 20 Issue 25, p5186-5189, 4p |
| Abstrakt: |
HfO2nanoparticles stabilized with selected ligands possess high refractive index and low absorbance under 193 nm radiation. These materials combined with an appropriate photopolymer were used as a nanocomposite photoresist. The resulting nanocomposite materials were used successfully for high resolution patterning. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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