Laser annealing of silicon.
| Autor: | Poate, John M., Brown, Walter L. |
|---|---|
| Předmět: | |
| Zdroj: | Physics Today; Jun82, Vol. 35 Issue 6, p24, 7p |
| Abstrakt: | Focuses on the technology of laser annealing of silicon. Information on how to make integrated circuits; Effect of pulsed or continuous-wave laser radiation on ion-implantation damage in semiconductors; Features and applications of silicon crystal growth and solidification revealed through annealing techniques. |
| Databáze: | Complementary Index |
| Externí odkaz: |
|