Thin copper film for plasma etching of quartz.

Autor:	Volkov, A., Pavelyev, V., Moiseev, O., Eropolov, V., Volodkin, B., Tukmakov, K.
Zdroj:	Optical Memory & Neural Networks; Mar2009, Vol. 18 Issue 1, p40-43, 4p
Abstrakt:	We discuss a method for generating a diffractive optical microrelief by plasmochemical etching with the use of a masking copper layer. [ABSTRACT FROM AUTHOR]
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu Full text from SpringerLink