New buffer concept inherent to pulsed laser induced epitaxy.

Autor: Guedj, Cyril, Boulmer, Jacques, Nouet, Ge´rard, Godet, C., Roca i Cabarrocas, P.
Předmět:
Zdroj: Applied Physics Letters; 5/4/1998, Vol. 72 Issue 18, 1 Black and White Photograph, 1 Graph
Abstrakt: We demonstrate the growth of a 250 nm-thick graded buffer based on Si[sub 1-x-y]Ge[sub x]C[sub y]. This buffer, with 0
Databáze: Complementary Index