| Autor: |
Lukitsch, M. J., Danylyuk, Y. V., Naik, V. M., Huang, C., Auner, G. W., Rimai, L., Naik, R. |
| Předmět: |
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| Zdroj: |
Applied Physics Letters; 7/30/2001, Vol. 79 Issue 5, 1 Black and White Photograph, 3 Graphs |
| Abstrakt: |
Epitaxial Al[sub 1-x]In[sub x]N thin films with 0≤x≤1 have been grown by plasma source molecular beam epitaxy on sapphire (0001) substrates at a low temperature of 375 °C. Both reflection high-energy electron diffraction and x-ray diffraction measurements confirm the c-plane growth with the following epitaxial relations: nitride [0001] || sapphire [0001] and nitride [011¯0] || sapphire [21¯1¯0]. However, the degree of crystalline mosaicity and the compositional fluctuation increase with increasing x. The observed direct energy band gap, determined using optical transmission and reflection measurements show relatively less bowing compared to some earlier studies. Electrical resistivity and Hall effect measurements show n-type electrical conductivity in these alloys with carrier concentrations n>=10[sup 19] cm[sup -3] for In-rich alloys and n≤10[sup 10] cm[sup -3] for Al-rich alloys. © 2001 American Institute of Physics. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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