| Autor: |
Sturm, Kai, Krebs, Hans-Ulrich |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 7/15/2001, Vol. 90 Issue 2, p1061, 3p, 1 Diagram, 3 Graphs |
| Abstrakt: |
During pulsed laser deposition in ultrahigh vacuum, the deposited material consists of a large fraction of ions with kinetic energies in the range of 100 eV. In many cases, these energetic particles induce resputtering at the film surface and lead to composition deviations. For Fe–Ag the resputtering effects are quantified by monitoring the deposition rate during growth of elementary and multilayer films. It is shown that preferential resputtering and, therefore, composition deviations of alloy films can be reduced at laser fluences close to the ablation threshold or even better under Ar gas pressure of about 0.05 mbar. The experimental results are described by a model, which includes atom deposition on the film surface, implantation of energetic ions below the surface and resputtering of atoms from the top monolayer. © 2001 American Institute of Physics. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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