Autor: |
Kirk, Daniel J., Cockayne, David J. H., Petford-Long, Amanda K., Yi, Ge |
Předmět: |
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Zdroj: |
Journal of Applied Physics; Dec2009, Vol. 106 Issue 12, p123915-1-123915-3, 3p, 1 Diagram, 1 Chart, 3 Graphs |
Abstrakt: |
The effects of oxidation time and annealing conditions on sputter-deposited magnetic tunnel junctions with a TiOx barrier have been investigated. High resolution electron microscopy showed that longer oxidation times led to a significant increase in barrier layer width and to the formation of large volumes of oxides of Co and Fe. Annealing promoted extensive diffusion of Mn to the barrier region and the oxidation of Mn to MnOx concurrent with the reduction in oxides of Co and Fe. Annealing also increased the peak oxygen content of the barrier region and resulted in a distinct asymmetry in the barrier oxide structure. [ABSTRACT FROM AUTHOR] |
Databáze: |
Complementary Index |
Externí odkaz: |
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