| Autor: |
Jing Wan, Zhen Shu, Shao-Ren Deng, Shen-Qi Xie, Bing-Rui Lu, Ran Liu, Yifang Chen, Xin-Ping Qu |
| Předmět: |
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| Zdroj: |
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; Jan2009, Vol. 27 Issue 1, p19-22, 4p, 6 Diagrams |
| Abstrakt: |
In this work, a trilayer technique used in the nanoimprint lithography process to replicate the templates is developed. The SU8/SiO2/PMMA trilayer was used. The photosensitive epoxy (SU8 resist) which has a low glass transition temperature was used as the imprint layer. Polymethylmethacrylate (PMMA) was used as the transfer layer. A SiO2 layer is placed between the SU8 and PMMA to act as a protective layer due to its strong resistance to oxygen reactive ion etching. By optimizing imprint and etching processes, master templates with minimum feature size of 150 nm and period of 300 nm can be successfully duplicated. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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