Thermal strain-induced dielectric anisotropy in Ba0.7Sr0.3TiO3 thin films grown on silicon-based substrates.

Autor: Zhu, X. H., Guigues, B., Defaÿ, E., Dubarry, C., Aïd, M.
Předmět:
Zdroj: Journal of Applied Physics; Jul2009, Vol. 106 Issue 2, p024109-024114, 5p, 2 Diagrams, 5 Graphs
Abstrakt: Dielectric properties of Ba0.7Sr0.3TiO3 (BST) thin films, which were prepared on silicon-based substrates by ion beam sputtering and postdeposition annealing method, were systematically investigated in different electrode configurations of metal-insulator-metal and coplanar interdigital capacitors. It was found that a large dielectric anisotropy exists in the films with better in-plane dielectric properties (higher dielectric permittivity and tunability) than those along the out-of-plane direction. The observed anisotropic dielectric responses are explained qualitatively in terms of a thermal strain effect that is related to dissimilar film strains along the in-plane and out-of-plane directions. Another reason for the dielectric anisotropy is due to different influences of the interfacial low-dielectric layer between the BST film and the substrate (metal electrode). [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index