| Autor: |
Ito, W., Okayama, S., Homma, N., Oishi, A., Morishita, T. |
| Předmět: |
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| Zdroj: |
Applied Physics Letters; 1/18/1993, Vol. 62 Issue 3, p312, 3p, 1 Chart, 6 Graphs |
| Abstrakt: |
Examines YBa[sub 2]Cu[sub 3]O[sub 7-x] thin films using a designed dc-94.92 MHz hybrid plasma magnetron sputtering system. Implication of the cathode current for film crystalline orientation; Indication of increased emission line intensity through optical emission spectroscopy; Discussion on the crystallinity of films. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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