| Autor: |
Ketchen, M.B., Pearson, D., Kleinsasser, A.W., Hu, C.-K., Smyth, M., Logan, J., Stawiasz, K., Baran, E., Jaso, M., Ross, T., Petrillo, K., Manny, M., Basavaiah, S., Brodsky, S., Kaplan, S.B., Gallagher, W.J., Bhushan, M. |
| Předmět: |
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| Zdroj: |
Applied Physics Letters; 11/11/1991, Vol. 59 Issue 20, p2609, 3p, 3 Black and White Photographs, 8 Diagrams, 2 Graphs |
| Abstrakt: |
Demonstrates a planarized all-refractory technology for low superconductivity. Fabrication of Josephson junctions; Excellence of junction quality. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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