Magnetic-field-enhanced rf argon plasma for ionized sputtering of copper.

Autor: Wang, W., Foster, J., Wendt, A.E., Booske, J.H., Onuoha, T., Sandstrom, P.W., Liu, H., Gearhart, S.S., Hershkowitz, N.
Předmět:
Zdroj: Applied Physics Letters; 9/22/1997, Vol. 71 Issue 12, p1622, 3p, 1 Diagram, 3 Graphs
Abstrakt: Evaluates the use of multipole magnetic field to enhance an inductively coupled radio frequency argon plasma for ionized magnetron sputtering of copper. Inclusion of Langmuir probe and optical emission spectroscopy measurements; Assumption of constant electron energy distribution function.
Databáze: Complementary Index