Positive ions as growth precursors in plasma enhanced chemical vapor deposition of hydrogenated...

Autor: Hamers, E.A.G., Bezemer, J., van der Weg, W.F.
Předmět:
Zdroj: Applied Physics Letters; 8/2/1999, Vol. 75 Issue 5, p609, 3p, 1 Diagram, 5 Graphs
Abstrakt: Presents a method to determine the contribution of ions to the growth rate in capacitively coupled plasma deposition systems. Spatial separation of ions and radicals from the plasma by a small aperture in front of the substrate; Cause of separation; Angular distribution of the velocity of the particles.
Databáze: Complementary Index