Autor: |
Hamers, E.A.G., Bezemer, J., van der Weg, W.F. |
Předmět: |
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Zdroj: |
Applied Physics Letters; 8/2/1999, Vol. 75 Issue 5, p609, 3p, 1 Diagram, 5 Graphs |
Abstrakt: |
Presents a method to determine the contribution of ions to the growth rate in capacitively coupled plasma deposition systems. Spatial separation of ions and radicals from the plasma by a small aperture in front of the substrate; Cause of separation; Angular distribution of the velocity of the particles. |
Databáze: |
Complementary Index |
Externí odkaz: |
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