Nanometer-scale linewidth fluctuations caused by polymer aggregates in resist films.
| Autor: | Yamaguchi, Toru, Namatsu, Hideo |
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| Zdroj: | Applied Physics Letters; 10/20/1997, Vol. 71 Issue 16, p2388, 3p, 3 Black and White Photographs, 3 Graphs |
| Abstrakt: | Examines linewidth fluctuations caused by granular structures of resist polymer aggregates. Dependence of molecular weight on aggregate size; Extraction of polymer aggregates from the resist surface; Influence of the resist polymer aggregate on the development behavior. |
| Databáze: | Complementary Index |
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