Nanometer-scale linewidth fluctuations caused by polymer aggregates in resist films.
Autor: | Yamaguchi, Toru, Namatsu, Hideo |
---|---|
Předmět: | |
Zdroj: | Applied Physics Letters; 10/20/1997, Vol. 71 Issue 16, p2388, 3p, 3 Black and White Photographs, 3 Graphs |
Abstrakt: | Examines linewidth fluctuations caused by granular structures of resist polymer aggregates. Dependence of molecular weight on aggregate size; Extraction of polymer aggregates from the resist surface; Influence of the resist polymer aggregate on the development behavior. |
Databáze: | Complementary Index |
Externí odkaz: |